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High Techne: Art and Technology from the Machine Aesthetic to the Posthuman
R.L. Rutsky
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Description for High Techne: Art and Technology from the Machine Aesthetic to the Posthuman
Paperback. Series: Electronic Mediations. Num Pages: 192 pages. BIC Classification: ACX. Category: (UU) Undergraduate. Dimension: 151 x 230 x 11. Weight in Grams: 290.
Explores our changing cultural perceptions of the relations between technology and art.
In an age of high tech, our experience of technology has changed tremendously, yet the definition of technology has remained largely unquestioned. High Techne redresses this gap in thinking about technology, examining the shifting relations of technology, art, and culture from the beginnings of modernity to contemporary technocultures.
Drawing on the Greek root of technology, (techne, generally translated as “art, skill, or craft”), R. L. Rutsky challenges both the modernist notion of technology as an instrument or tool and the conventional idea of a noninstrumental aesthetics. Today, technology and aesthetics ... Read more Progressing from the major art movements of modernism to contemporary science fiction and cultural theory, Rutsky provides clear and compelling evidence of a shift in the cultural conceptions of technology and art and demonstrates the centrality of technology to modernism and postmodernism. Show LessProduct Details
Publisher
University of Minnesota Press United States
Number of pages
192
Format
Paperback
Publication date
1999
Series
Electronic Mediations
Condition
New
Number of Pages
208
Place of Publication
Minnesota, United States
ISBN
9780816633562
SKU
V9780816633562
Shipping Time
Usually ships in 7 to 11 working days
Ref
99-50
About R.L. Rutsky
R. L. Rutsky is assistant professor of communications and theatre at the University of Notre Dame.
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