Chemical Vapor Deposition
Srinivasan Sivaram
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Description for Chemical Vapor Deposition
Paperback. Num Pages: 292 pages, 143 black & white illustrations, biography. BIC Classification: THR; TJFC. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 17. Weight in Grams: 474.
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some ... Read more
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some ... Read more
Product Details
Format
Paperback
Publication date
2013
Publisher
Springer-Verlag New York Inc. United States
Number of pages
292
Condition
New
Number of Pages
292
Place of Publication
New York, NY, United States
ISBN
9781475747539
SKU
V9781475747539
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
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