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Design for Manufacturability with Advanced Lithography
Pan, David Z.; Yu, Bei
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Description for Design for Manufacturability with Advanced Lithography
Hardback. Num Pages: 175 pages, 35 black & white tables, biography. BIC Classification: TJF; UYF; UYM. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 11. Weight in Grams: 432.
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Product Details
Format
Hardback
Publication date
2015
Publisher
Springer International Publishing AG Switzerland
Number of pages
175
Condition
New
Number of Pages
164
Place of Publication
Cham, Switzerland
ISBN
9783319203843
SKU
V9783319203843
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
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