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Foord - Chemical Beam Epitaxy and Related Techniques - 9780471967484 - V9780471967484
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Chemical Beam Epitaxy and Related Techniques

€ 461.28
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Description for Chemical Beam Epitaxy and Related Techniques Paperback. Chemical beam epitaxy is a method of growing semiconductor layers which has wide-ranging application in the international electronics and opto-electronic industries. Editor(s): Foord, J.S.; Davies, G.J.; Tsang, W.T. Num Pages: 460 pages, Illustrations. BIC Classification: PHFC; TJFD5. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly; (UU) Undergraduate. Dimension: 242 x 160 x 32. Weight in Grams: 844.
Chemical Beam Epitaxy (CBE), is a powerful growth technique which has come to prominence over the last ten years. Together with the longer established molecular beam epitaxy (MBE) and metal organic vapour phase epitaxy (MOVPE), CBE provides a capability for the epitaxial growth of semiconductor and other advanced materials with control at the atomic limit. This, the first book dedicated to CBE, and closely related techniques comprises chapters by leading research workers in the field and provides a detailed overview of the state-of-the-art in this area of semiconductor technology. Topics covered include equipment design and safety considerations, design of chemical ... Read more

Product Details

Format
Paperback
Publication date
1997
Publisher
John Wiley and Sons Ltd United Kingdom
Number of pages
460
Condition
New
Number of Pages
460
Place of Publication
New York, United States
ISBN
9780471967484
SKU
V9780471967484
Shipping Time
Usually ships in 7 to 11 working days
Ref
99-50

About Foord
John S Foord and G. J. Davies are the authors of Chemical Beam Epitaxy and Related Techniques, published by Wiley.

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