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Atomic Layer Deposition for Semiconductors
Hwang Cheol Seong
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Description for Atomic Layer Deposition for Semiconductors
Paperback. .
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Product Details
Publisher
Springer-Verlag New York Inc.
Format
Paperback
Publication date
2016
Condition
New
Number of Pages
263
Place of Publication
New York, United States
ISBN
9781489979438
SKU
V9781489979438
Shipping Time
Usually ships in 4 to 8 working days
Ref
99-1
About Hwang Cheol Seong
Cheol Seong Hwang received M.S. and Ph.D. degrees from Seoul National University, Seoul, Korea, in 1989 and 1993, respectively. In 1993, he joined the Material Science and Engineering Laboratory at the National Institutes of Standards and Technology, Gaithersburg, MD, as a Postdoctoral Research Fellow. He then joined Samsung Electronics Company, Ltd., as a Senior Researcher in 1994. In 1998, Dr. ... Read more
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