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Xu Ma - Computational Lithography - 9780470596975 - V9780470596975
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Computational Lithography

€ 136.64
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Description for Computational Lithography Hardcover. This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches. Series: Wiley Series in Pure and Applied Optics. Num Pages: 226 pages, Illustrations. BIC Classification: TJFC. Category: (P) Professional & Vocational. Dimension: 242 x 163 x 18. Weight in Grams: 496.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography

Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches.

The book starts with an introduction to ... Read more

The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography.

Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.

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Product Details

Format
Hardback
Publication date
2010
Publisher
John Wiley & Sons Inc United Kingdom
Number of pages
226
Condition
New
Series
Wiley Series in Pure and Applied Optics
Number of Pages
256
Place of Publication
New York, United States
ISBN
9780470596975
SKU
V9780470596975
Shipping Time
Usually ships in 7 to 11 working days
Ref
99-50

About Xu Ma
Dr. Xu Ma received a PhD in electrical and computer engineering from the University of Delaware. He is now with the Electrical Engineering and Computer Science Department at the University of California at Berkeley. Dr. Ma's research interests include computational imaging, signal processing, and computational lithography. Dr. Gonzalo R. Arce received a PhD degree in electrical engineering from Purdue ... Read more

Reviews for Computational Lithography
"Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. " (Consumer Electronics Net, 15 March 2011)

Goodreads reviews for Computational Lithography


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