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Silicon Technologies: Ion Implantation and Thermal Treatment
Annie Baudrant
€ 180.05
FREE Delivery in Ireland
Description for Silicon Technologies: Ion Implantation and Thermal Treatment
Hardback. * Specifically in the field of microelectronics, the self-fulfilling power of Moore s Law has driven an amazing pace of technological advances * This book explains the fundamental physical and chemical rules in major front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion . Editor(s): Baudrant, Annie. Num Pages: 356 pages, Illustrations. BIC Classification: TJF. Category: (P) Professional & Vocational. Dimension: 156 x 239 x 27. Weight in Grams: 676.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Product Details
Format
Hardback
Publication date
2011
Publisher
ISTE Ltd and John Wiley & Sons Inc United Kingdom
Number of pages
368
Condition
New
Number of Pages
368
Place of Publication
London, United Kingdom
ISBN
9781848212312
SKU
V9781848212312
Shipping Time
Usually ships in 7 to 11 working days
Ref
99-1
About Annie Baudrant
Annie Baudrant, Director of Program Coordination, Technologies and Compounds Management, CEA-LETi.
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