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Ion Implantation in Semiconductors
Susumu . Ed(S): Namba
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Description for Ion Implantation in Semiconductors
Paperback. Editor(s): Namba, Susumu. Num Pages: 742 pages, 97 black & white illustrations, biography. BIC Classification: PHFC; PNFS; TJFD5. Category: (P) Professional & Vocational. Dimension: 254 x 178 x 38. Weight in Grams: 1429.
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope ... Read more
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope ... Read more
Product Details
Format
Paperback
Publication date
2013
Publisher
Springer-Verlag New York Inc. United States
Number of pages
742
Condition
New
Number of Pages
742
Place of Publication
New York, NY, United States
ISBN
9781468421538
SKU
V9781468421538
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
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