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Modeling of Chemical Vapor Deposition of Tungsten Films
Kleijn, Chris R.; Werner, Christoph
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Description for Modeling of Chemical Vapor Deposition of Tungsten Films
Paperback. Series: Progress in Numerical Simulation for Microelectronics. Num Pages: 140 pages, black & white illustrations. BIC Classification: TJF. Category: (P) Professional & Vocational. Dimension: 229 x 152 x 7. Weight in Grams: 198.
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity ... Read more
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity ... Read more
Product Details
Format
Paperback
Publication date
2013
Publisher
Springer Basel Switzerland
Number of pages
140
Condition
New
Series
Progress in Numerical Simulation for Microelectronics
Number of Pages
139
Place of Publication
Basel, Switzerland
ISBN
9783034877435
SKU
V9783034877435
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
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