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Evolution of Thin Film Morphology: Modeling and Simulations
Pelliccione, Matthew; Lu, Toh-Ming
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Description for Evolution of Thin Film Morphology: Modeling and Simulations
paperback. Series: Springer Series in Materials Science. Num Pages: 218 pages, biography. BIC Classification: TJFD5. Category: (P) Professional & Vocational. Dimension: 234 x 156 x 11. Weight in Grams: 316.
Thin?lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and microstructure of thin ?lms directly controls their optical, magnetic, and electrical properties, which are often signi?cantly di?erent from bulk material properties. Precise control of morphology and microstructure during thin ?lm growth is paramount to producing the - sired ?lm quality for speci?c applications. To date, many thin ?lm deposition techniques have been employed for manufacturing ?lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of ?lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough ... Read more
Thin?lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and microstructure of thin ?lms directly controls their optical, magnetic, and electrical properties, which are often signi?cantly di?erent from bulk material properties. Precise control of morphology and microstructure during thin ?lm growth is paramount to producing the - sired ?lm quality for speci?c applications. To date, many thin ?lm deposition techniques have been employed for manufacturing ?lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of ?lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough ... Read more
Product Details
Format
Paperback
Publication date
2010
Publisher
Springer United States
Number of pages
218
Condition
New
Series
Springer Series in Materials Science
Number of Pages
206
Place of Publication
New York, NY, United States
ISBN
9781441925800
SKU
V9781441925800
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
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