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. Ed(S): Doornbos, Richard; Van Loo, Sjir - From Scientific Instrument to Industrial Machine - 9789400741461 - V9789400741461
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From Scientific Instrument to Industrial Machine

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Description for From Scientific Instrument to Industrial Machine Paperback. Architectural stress is the inability of a system design to respond to new market demands. It is an important yet often concealed issue in high tech systems. In this book, the authors look at the phenomenon of architectural stress in embedded systems in the context of a transmission electron microscope system built by FEI Company. Editor(s): Doornbos, Richard; Van Loo, Sjir. Series: SpringerBriefs in Electrical and Computer Engineering. Num Pages: 112 pages, 55 black & white illustrations, 1 black & white tables, 1 colour tables, biography. BIC Classification: PBWH; PNFS; UYD; UYQE. Category: (P) Professional & Vocational. Dimension: 234 x 156 x 6. Weight in Grams: 188.

Architectural stress is the inability of a system design to respond to new market demands. It is an important yet often concealed issue in high tech systems. In From scientific instrument to industrial machine, we look at the phenomenon of architectural stress in embedded systems in the context of a transmission electron microscope system built by FEI Company. Traditionally, transmission electron microscopes are manually operated scientific instruments, but they also have enormous potential for use in industrial applications. However, this new market has quite different characteristics. There are strong demands for cost-effective analysis, accurate and precise measurements, and ease-of-use. These ... Read more

From scientific instrument to industrial machine takes a pragmatic approach to the problem of architectural stress. In particular, it describes the outcomes of the Condor project, a joint endeavour by a consortium of industrial and academic partners. In this collaboration an integrated approach was essential to successfully combine various scientific results and show the first steps towards a new direction. System modelling and prototyping were the key techniques to develop better understanding and innovative solutions to the problems associated with architectural stress.

From scientific instruments to industrial machine is targeted mainly at industrial practitioners, in particular system architects and engineers working on high tech systems. It can therefore be read without particular knowledge of electron microscope systems or microscopic applications. The book forms a bridge between academic and applied science, and high tech industrial practice. By showing the approaches and solutions developed for the electron microscope, it is hoped that system designers will gain some insights in how to deal with architectural stress in similar challenges in the high tech industry.

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Product Details

Format
Paperback
Publication date
2012
Publisher
Springer Netherlands
Number of pages
112
Condition
New
Series
SpringerBriefs in Electrical and Computer Engineering
Number of Pages
112
Place of Publication
Dordrecht, Netherlands
ISBN
9789400741461
SKU
V9789400741461
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15

About . Ed(S): Doornbos, Richard; Van Loo, Sjir
Richard Doornbos started as a research fellow at ESI in September 2008. His interests centre on the exploration and reasoning about system architectures, system-level behavior modeling and multi-disciplinary system design. Studied Technical Physics at the University of Twente, where his thesis ‘Optical Characterization in Flow Cytometry: Optimization and Miniaturization’ resulted in a PhD degree in 1995. He accepted a post-doctorate position ... Read more

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