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Nastasi, Michael; Mayer, James W. - Ion Implantation and Synthesis of Materials - 9783540236740 - V9783540236740
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Ion Implantation and Synthesis of Materials

€ 128.69
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Description for Ion Implantation and Synthesis of Materials Hardback. Ion implantation is one of the key processing steps in silicon integrated circuit technology. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Series: Springer Series in Materials Science. Num Pages: 263 pages, 131 black & white illustrations, 10 black & white tables, biography. BIC Classification: PHFC; PHP; PNR; TGMT; TJFD. Category: (P) Professional & Vocational. Dimension: 165 x 242 x 27. Weight in Grams: 580.
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. ... Read more

Product Details

Format
Hardback
Publication date
2006
Publisher
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG Germany
Number of pages
263
Condition
New
Series
Springer Series in Materials Science
Number of Pages
263
Place of Publication
Berlin, Germany
ISBN
9783540236740
SKU
V9783540236740
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15

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