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Nastasi, Michael; Mayer, James W. - Ion Implantation and Synthesis of Materials - 9783642062599 - V9783642062599
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Ion Implantation and Synthesis of Materials

€ 121.80
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Description for Ion Implantation and Synthesis of Materials Paperback. Num Pages: 263 pages, 131 black & white illustrations, 10 black & white tables, biography. BIC Classification: PHFC; PHP; PNR; TGMT; TJFD. Category: (P) Professional & Vocational. Dimension: 234 x 156 x 14. Weight in Grams: 433.
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. ... Read more

Product Details

Format
Paperback
Publication date
2010
Publisher
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG Germany
Number of pages
263
Condition
New
Number of Pages
263
Place of Publication
Berlin, Germany
ISBN
9783642062599
SKU
V9783642062599
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15

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