.png){kind=logo}
Stock image for illustration purposes only - book cover, edition or condition may vary.
Ion Implantation
Emanuele Rimini
€ 290.58
FREE Delivery in Ireland
Description for Ion Implantation
Hardback. A collection of research dealing with several aspects of ion implantation, including basic information on the physics of devices, ion implanters, channeling implants, yield, damage and its annealing, in addition to a host of other topics. Series: The Springer International Series in Engineering and Computer Science. Num Pages: 393 pages, biography. BIC Classification: PHF; TD. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 234 x 156 x 23. Weight in Grams: 752.
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics ... Read more
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics ... Read more
Product Details
Format
Hardback
Publication date
1994
Publisher
Kluwer Academic Publishers United States
Number of pages
393
Condition
New
Series
The Springer International Series in Engineering and Computer Science
Number of Pages
393
Place of Publication
Dordrecht, Netherlands
ISBN
9780792395201
SKU
V9780792395201
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
Reviews for Ion Implantation