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Kamil A. Valiev - The Physics Of Submicron Lithography     - 9780306435782 - V9780306435782
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The Physics Of Submicron Lithography

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Description for The Physics Of Submicron Lithography Hardback. Details the physics behind the methods of generating submicron forms for electron beam, ion beam, optical, and X-ray lithography. This monograph discusses topics at the level of analytical theory, allowing a study of scientific issues in the field without frequent reference to a general physics text. Series: Microdevices. Num Pages: 504 pages, biography. BIC Classification: PHFC. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly; (UU) Undergraduate. Dimension: 254 x 178 x 25. Weight in Grams: 2600.
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop­ erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the ... Read more

Product Details

Format
Hardback
Publication date
1992
Publisher
Springer Science+Business Media United States
Number of pages
504
Condition
New
Series
Microdevices
Number of Pages
493
Place of Publication
, United States
ISBN
9780306435782
SKU
V9780306435782
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15

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