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Silicon Technologies: Ion Implantation and Thermal Treatment
Annie Baudrant
€ 177.62
FREE Delivery in Ireland
Description for Silicon Technologies: Ion Implantation and Thermal Treatment
Hardback. * Specifically in the field of microelectronics, the self-fulfilling power of Moore s Law has driven an amazing pace of technological advances * This book explains the fundamental physical and chemical rules in major front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion . Editor(s): Baudrant, Annie. Num Pages: 356 pages, Illustrations. BIC Classification: TJF. Category: (P) Professional & Vocational. Dimension: 156 x 239 x 27. Weight in Grams: 676.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Product Details
Format
Hardback
Publication date
2011
Publisher
ISTE Ltd and John Wiley & Sons Inc United Kingdom
Number of pages
368
Condition
New
Number of Pages
368
Place of Publication
London, United Kingdom
ISBN
9781848212312
SKU
V9781848212312
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15
About Annie Baudrant
Annie Baudrant, Director of Program Coordination, Technologies and Compounds Management, CEA-LETi.
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